TY - JOUR
T1 - Changes in the electronic structure of DiMePTCDI films on S-GaAs(100) upon exposure to oxygen
AU - Gavrila, Gianina
AU - Méndez, Henry
AU - Kampen, Thorsten U.
AU - Zahn, Dietrich R.T.
N1 - Funding Information:
Financial support by the EU DIODE network (HPRNCT-1999-00164) is gratefully acknowledged.
PY - 2004/7/15
Y1 - 2004/7/15
N2 - The electronic properties of N,N′-dimethyl-3,4,9,10-perylene tetracarboxylic diimide (DiMePTCDI) films deposited on S-GaAs(100) surfaces are studied by ultraviolet photoelectron spectroscopy (UPS). The energy position of the highest occupied molecular orbital (HOMO) of clean DiMePTCDI films is found to be at 2.04 ± 0.10eV with respect to Fermi level. Exposure to oxygen results in a shift of the HOMO from its original position by 0.25 ± 0.10eV towards the middle of the band gap. The shift explains the dramatic decrease of the current in the current-voltage (I-V) characteristics upon oxygen exposure of Ag/DiMePTCDI/S-GaAs(100) Schottky diodes.
AB - The electronic properties of N,N′-dimethyl-3,4,9,10-perylene tetracarboxylic diimide (DiMePTCDI) films deposited on S-GaAs(100) surfaces are studied by ultraviolet photoelectron spectroscopy (UPS). The energy position of the highest occupied molecular orbital (HOMO) of clean DiMePTCDI films is found to be at 2.04 ± 0.10eV with respect to Fermi level. Exposure to oxygen results in a shift of the HOMO from its original position by 0.25 ± 0.10eV towards the middle of the band gap. The shift explains the dramatic decrease of the current in the current-voltage (I-V) characteristics upon oxygen exposure of Ag/DiMePTCDI/S-GaAs(100) Schottky diodes.
KW - Energy level alignment
KW - Organic materials
KW - Schottky contacts modification
UR - http://www.scopus.com/inward/record.url?scp=3342927885&partnerID=8YFLogxK
U2 - 10.1016/j.apsusc.2004.05.261
DO - 10.1016/j.apsusc.2004.05.261
M3 - Article
AN - SCOPUS:3342927885
SN - 0169-4332
VL - 234
SP - 126
EP - 130
JO - Applied Surface Science
JF - Applied Surface Science
IS - 1-4
T2 - The Ninth International Conference on the Formation of Semicon
Y2 - 15 September 2003 through 19 September 2003
ER -