Thickness and photocatalytic activity relation in TiO2:N films grown by atomic layer deposition with methylene-blue and E. coli bacteria

M. M.M. Contreras Turrubiartes, E. López Luna, J. L. Enriquez-Carrejo, A. Pedroza Rodriguez, J. C. Salcedo Reyes, M. A. Vidal Borbolla, P. G. Mani-Gonzalez

Research output: Contribution to journalArticlepeer-review

1 Scopus citations

Abstract

This study presents an analysis of the photocatalytic efficiency in TiO2:N thin films grown by atomic layer deposition related to the film thickness. The nitriding process was carried out with nitrogen plasma by molecular nitrogen decomposition after TiO2 deposition. The study was performed using the time-dependent degradation of colour units for methylene-blue solutions and inactivation percentages for Escherichia coli bacteria, for potential applications in sewage purification. To determine the optoelectronic properties of the films, the optical, structural, surface and thickness characterizations were carried out by photoluminescence, Raman spectroscopy, atomic force microscopy and scanning electron microscopy, respectively.

Original languageEnglish
Pages (from-to)1225-1230
Number of pages6
JournalBulletin of Materials Science
Volume40
Issue number6
DOIs
StatePublished - Oct 2017

Keywords

  • Anatase phase
  • Atomic layer deposition
  • Degradation
  • Inactivation
  • Photocatalytic
  • Photoluminescence

Fingerprint

Dive into the research topics of 'Thickness and photocatalytic activity relation in TiO2:N films grown by atomic layer deposition with methylene-blue and E. coli bacteria'. Together they form a unique fingerprint.

Cite this